Cleanroom (200 mm Compatible Tool Set)

Photolithography

  • Laurell Technologies Spin Coater and Processor w/Wet Station
  • OAI 8808 4/8” Mask Aligner with DUV
  • Ultron Systems UH102-8 UV Curing System
  • Yield Engineering Systems (YES) 310 TA HMDS Vapor Prime Oven

Dry Etching

  • Lam Research Corp. Rainbow 4400/20B Plasma Etch Systems
  • Plasma Etch Inc. PE-100-RIE Plasma Etch asher/etcher/cleaner
  • STS Multiplex Inductively Coupled Plasma Etch System

Deposition

  • Lesker PVD75 DC and RF Sputtering
  • Lesker PVD75 Thermal and E-beam Deposition
  • Novellus Concept II PECVD

Thermal Processing

  • Oxidation and Annealing Furnace
  • Vapor-Phase Deposition Tube Furnace for 2D Materials
  • Fisher 282a Vacuum Oven

Wet Processing

  • Wet Etching Station – (2)
  • CMOS Clean Bench
  • Solvent and Lithography Bench

Post Processing

  • Tousimis 916B Critical Point Dryer
  • Lam IPEC 472 CMP (4, 6” and 8”)
  • Lam Ontrak Brush Cleaner
  • Reynolds tech Gold Plating Bench

Metrology

  • Carl Zeiss Microscope
  • Gaertner Scientific LSE-WS Ellipsometer
  • KLA – Tencor P-10 Profilometer
  • Jandel 4-point Resistivity Probe

Patterning

  • Zeiss EVO LS-SEM with E-beam litho
  • Horiba XACTII Arrayer System
  • Microfab Jetlab4 Inkjet Printer

Bottom-up Material Synthesis

  • CEM Discover Solvent-based Synthesis Microwave
  • Glove Box
  • Schlenk Lines and Freeze Dryer
  • Thermo Scientific XFR high-capacity floor centrifuges
  • Nanocomposites synthesis
  • Electrospinning Nanofiber Setup
  • Large Substrate Furnace (1600 C)
  • South Bay Technologies 650 HC Diamond Saw
  • Flow Int. M2-1313b Waterjet Cutting Table
  • Fusion 3Design F306 3D printer
  • Dual Draft workbenches
  • Autoclave