Screen shot 2011-10-12 at 9.32.42 AM

Daniel Joseph Christian Herr, Ph.D.

Professor & Nanoscience Department Chair

Phone: 336-285-2862

Fax: 336-500-0115

Email: djherr@uncg.edu


Dr. Herr is a pioneer in collaborative nanotechnology research.  He is the Director of Semiconductor Research Corporation’s [SRC’s] Nanomanufacturing Sciences area, leading an international team that provides vision, guidance, and leveraged support for a number of the top interdisciplinary, nanoelectronics related, university research programs. He also serves as Adjunct Associate Professor in Materials Science and Engineering at North Carolina State University, where he co-teaches a graduate level course on The Materials Science of Nanoelectronics. He founded a quality engineering start-up that enabled rapid and robust, custom product, material, and process design. His suite of applied optimization tools is significantly more robust than Taguchi’s methodology. More recently, he was elected to serve as the AAAS Industrial Science and Technology section’s Member-at-Large, and Fellow of the International Society for Optical Engineering for the design, development, and commercialization of two early families of chemically amplified resists.  He is the inventor of several foundational patents and disclosures on defect tolerant patterning, controlled nanotube synthesis and placement, deterministic semiconductor doping, and ultimate CMOS devices. As founding co-chair of the International Technology Working Group on Emerging Research Materials, Dr. Herr provides ongoing technical leadership for the International Technology Roadmap for Semiconductors [ITRS] community.  He also serves as Senior Editor for IEEE Transactions in Nanotechnology, Coordinating Editor for the Journal of Nanoparticle Research, Reviewer for the Journal of Vacuum Science and Technology, and co-chair of several international technical conferences. He was as a contributing team member when SRC was awarded the 2005 National Medal of Technology.

Research Interests

Dr. Herr has 44 chemistry and semiconductor technology related publications, with papers in: The Journal of the Materials Research Society, IEEE Transactions on Nanotechnology, IEEE Transactions on Semiconductor Manufacturing, IEEE Computer, Journal of Nanoparticle Research, Proceedings of the International Society for Optical Engineering, American Chemical Society, and Tetrahedron Letters.  Also under his stewardship at SRC, research colleagues explored and developed:

  • Directed self assembly materials and processes sufficiently to achieve ‘Potential Solution’ status for emerging lithographic technologies the 2007 International Technology Roadmap for Semiconductor;
  • In-line rinse sensor technologies that reduce demonstrated a more than 40% reduction in water usage;
  • Metrology tools that proactively detected damage in 193nm optical materials that saved SRC members more than$100M;
  • New families of resist materials that broke the perceived 100nm barrier to optical lithography;
  • Families of catalytic filters that demonstrated the feasibility and cost-effectiveness of recycling  semiconductor aqueous waste streams;
  • Ink chemistries and maskless patterning technologies that established nano-copper particles as potential Pb solder replacements for emerging packaging technologies in the 2009 International technology Roadmap for Semiconductors.

Since 1992, this research portfolio has attracted more than $250M in SRC member company and externally leveraged support, graduate level university research in emerging semiconductor related material and process technologies.

Selected Publications

  1. Daniel J.C. Herr, Directed block copolymer self-assembly for nanoelectronics fabrication, Journal of the Materials Research, 26(2),  pp. 122-139 (January 28, 2011).
  2. Peter Burke, Chunlei Du, Daniel J.C. Herr, James O. Jensen, Paolo Lugli, Daniel J. Radack, Michael Stroscio, Venkataraman Swaminathan, Elias Towe, and Dwight L. Woolard, Untitled, IEEE Transactions on Nanotechnology, 10(1), pp. 3-6 (January 2011).
  3. Peter Burke, Chunlei Du, Daniel J.C. Herr, James O. Jensen, Paolo Lugli, Daniel J. Radack, Michael Stroscio, Venkataraman Swaminathan, Elias Towe, and Dwight L. Woolard, Device Concepts, Architectural Strategies, and Interfacing Methodologies for Nanoscale Sensor Systems, IEEE Transactions on Nanotechnology, 9(5), pp. 523-526 Special Issue (September 2010).
  4. Daniel J.C. Herr and Michael Garner, Emerging Research Materials, International Technology Roadmap for Semiconductors, 2009 Edition.
  5. Daniel J.C. Herr, Introduction:  New Technologies & Device Structures, Future Fab International, 26, on-line (July 10, 2008).
  6. Daniel J.C. Herr, Introduction:  New Technologies & Device Structures, Future Fab International, 24, on-line (January 25, 2008).
  7. Daniel J.C. Herr and Michael Garner, Emerging Research Materials, International Technology Roadmap for Semiconductors, 2007 Edition.
  8. Daniel J.C. Herr, Section 4 - Introduction: Lithography, Equipment, and Materials, Future Fab International, 23, on-line (July 9, 2007).
  9. Daniel J.C. Herr, Challenges in Directed Self-Assembly [1], Future Fab International, 22, on-line (January 9, 2007).

See more (CV)...

Patents

Patents, Disclosures, Proprietary Software, and Trade-Secrets: Dr. Herr is co-inventor on several patents, disclosures, proprietary software, and trade-secrets, including: Patents Issued (4)
  • Patterning Methods and Systems Using Reflected Interference Patterns; SRC Patent ID: P0267; TAIWAN, R.O.C. Patent No.: NI-1545 ; Inventors: Herr, SRC; Joy, UT/Knoxville; File Date: 21-Feb-2001; Issue Date: 1-May-2002
  • Solventless, Resistless, Direct Dielectric Patterning; SRC Patent ID: P0087; USA Patent No.: 6509138; Inventors: Gleason, MIT; Herr, SRC; Ober, Cornell; File Date: 12-Jan-2000; Issue Date: 21-Jan-2003
  • Solventless, Resistless, Direct Dielectric Patterning; SRC Patent ID: P0207; TAIWAN, R.O.C. Patent No.: 171285 ; Inventors: Gleason, MIT; Herr, SRC; Ober, Cornell; File Date: 9-Jan-2001; Issue Date: 2-Jun-2003
  • Supermolecular Structures and Devices Made from Same; SRC Patent ID: P0165; USA Patent No.: 6664559; Inventors: Herr, SRC; Zhirnov, SRC; File Date: 23-Feb-2000; Issue Date: 16-Dec-2003
Patents Pending (14)
  • Nanostructures Including Controllably positioned and Aligned Synthetic Nanotubes, and related methods; SRC Patent ID: P0416; Inventor: Herr, SRC; File Date: 1-Oct-2003
  • Deterministically Doped Field Effect Devices and Methods of Making Same; SRC Patent ID: P0417; Inventors: Herr, SRC; Zhirnov, NC State; File Date: 14-Aug-2003
  • Deterministically Doped Field Effect Devices and Methods of Making Same; SRC Patent ID: P0418; Inventors: Herr, SRC; Zhirnov, NC State; File Date: 25-Aug-2003
  • Nanostructures Including Controllably positioned and Aligned Synthetic Nanotubes, and related methods; SRC Patent ID: P0273; Inventors: Frechet, UC/Berkeley; Herr, SRC; File Date: 15-Oct-2002
  • Patterning Methods and Systems Using Reflected Interference Patterns; SRC Patent ID: P0195; Inventors: Herr, SRC; Joy, UT/Knoxville; File Date: 28-Feb-2000
  • Patterning Methods and Systems Using Reflected Interference Patterns; SRC Patent ID: P0262; Inventors: Herr, SRC; Joy, UT/Knoxville; File Date: 22-Feb-2001
  • Patterning Methods and Systems Using Reflected Interference Patterns; SRC Patent ID: P0329; Inventors: Herr, SRC; Joy, UT/Knoxville; File Date: 22-Feb-2001
  • Solventless, Resistless, Direct Dielectric Patterning; SRC Patent ID: P0217; Inventors: Gleason, MIT; Herr, SRC; Ober, Cornell; File Date: 11-Jan-2001
  • Solventless, Resistless, Direct Dielectric Patterning; SRC Patent ID: P0308; Inventors: Gleason, MIT; Herr, SRC; Ober, Cornell; File Date: 11-Jan-2001
  • Supercritical Fluid case; SRC Patent ID: P0327; Inventors: Gleason, MIT; Herr, SRC; Ober, Cornell; File Date: 23-Oct-2002; Research 426
  • Supermolecular Structures and Devices Made from Same; SRC Patent ID: P0229; Inventors: Herr, SRC; Zhirnov, SRC; File Date: 23-Feb-2001
  • Supermolecular Structures and Devices Made from Same; SRC Patent ID: P0230; Inventors: Herr, SRC; Zhirnov, SRC; File Date: 22-Feb-2001
  • Supermolecular Structures and Devices Made from Same; SRC Patent ID: P0317; Inventors: Herr, SRC; Zhirnov, SRC; File Date: 22-Feb-2001
  • Supermolecular Structures and Devices Made From Same; SRC Patent ID: P0425; Inventors: Herr, SRC; Zhirnov, SRC; File Date: 14-Oct-2003
Proprietary Software (1)
  • Concurrent Multi-response Optimization Toolset:  Version 1.0; Avatar R & D IP ID:  S87001; Inventor: Herr, Software Code Completed:  1984.
Disclosures Prepared (3)
  • Patterning Methods and Systems Using Reflected Interference Patterns; SRC Patent ID: P0428; Inventors: Herr, SRC; Joy, UT/Knoxville; Task 413.003
Trade Secrets (2)
  • A Remover for Acid Hardened Resists; Shipley Company Trade Secret;  Inventors:  Daniel J.C. Herr, Gary Calabrese, James W. Thackeray, and Theodore H. Fedynyshyn, Disclosure submitted to Shipley Company: 1991
  • A Developer for Submicron Lithography; Honeywell Corporation Trade Secret; Inventor: Daniel J.C. Herr, Disclosure submitted to Honeywell Corporation: 1988
Office Hours

By Appointment

Education

1984 Doctor of Philosophy University of California at Santa Cruz, CA

1976 BA (Honors) Chemistry Wesleyan University, CT

Authored Papers

Dr. Herr has developed materials for 7 undergraduate and graduate technical and science courses and co-authored or co-edited more than 4 books and proceedings, including: D.G. Seiler, A.C. Diebold, R. McDonald, C. M. Garner, D. Herr, PP. Khosla, E. M. Secula (Editors), Frontiers of Characterization and Metrology for Nanoelectronics: 2007, American Institute of Physics Conference Proceedings, 931, Melville, NY: American Institute of Physics (2007); Daniel J. Herr (Chair/ed.), Metrology, Inspection, and Process Control for Microlithography XVII, Parts I and II, Proceedings of the International Society for Optical Engineering, 5038, Bellingham, WA: International Society for Optical Engineering (2003); Lhadi Merhari, Kenneth E. Gonsalves, Elizabeth A Dobisz, Marie Angelopoulos, and Daniel Herr (ed.), (2002). Nanopatterning – From Ultralarge-Scale Integration to Biotechnology, Material Research Society Symposium Proceedings, 705, Materials Research Society:  Warrendale, PA (2002); Daniel J. Herr (Chair/ed.), Metrology, Inspection, and Process Control for Microlithography XVI, Parts I and II, Proceedings of The International Society for Optical Engineering, 4689, Bellingham, WA: International Society for Optical Engineering.