JSIRT Core Facilities

JSIRT provides access to imaging and analytical instrumentation for nano and microscale lithography, nanomaterial fabrication, characterization, and computation, as well as hands-on training in a shared user environment. The fee-for-use based resources, tools, and labs are available to academic, industry, and government users through JSIRT. Labs and tools are divided below by core areas:  Advanced Microscopy, Analytical Chemistry, Materials Testing, Micro and Nanofabrication, and Other Resources.  In addition to the labs and tools, users have access world-class specialized training and highly skilled staff.  Remote service is available.  The service rate (staff labor) is $100 per hour for external for-profit organizations (industry) and $50 per hour for internal and external non-profit organizations (academic/government).  All charges for service and for instrumentation are rounded to the nearest quarter hour.

Advanced Microscopy

JSIRT offers access to a suite of advanced microscopy tools and resources, including equipment training, remote sample preparation and analysis, and new process and imaging consultations. In addition to a wide variety of visualization, characterization and fabrication tools with micro and nanometer scale controllability, JSIRT also provides expert-driven analysis through skilled research staff to address the needs of academic, industry and government users.

Analytical Chemistry

Whether you want to determine chemical structure or quantify trace elements, JSIRT offers access to a suite of analytical tools and resources including equipment training, remote material analysis and process consultations. JSIRT provides expert-driven analysis through skilled research staff to address the needs of academic, industry and government users.

Materials Testing

JSIRT provides material testing resources for aerospace, automotive, textile, chemical, analytical and physical testing applications. In addition to testing services, JSIRT provides research and consulting services. JSIRT specializes particularly in polymer matrix fiber reinforced composites and textiles.

Micro and Nanofabrication

JSIRT offers access to a suite of cleanroom micro/nanofabrication and material synthesis tools and resources, including equipment training, remote service, material analysis and consultations. JSNN provides expert-driven process development and analysis through skilled research staff to address the needs of academic, industry and government users.

Note:  Tools in the cleanroom will incur cleanroom use fees in addition to instrumentation rates, if applicable.

Other Resources

Beyond Advanced Microscopy, Analytical Chemistry, Materials Testing, and Micro and Nanofabrication, there are other resources available through JSIRT.

Full Instrumentation Listing

The full listing of JSIRT tools and labs is included below.  This listing is searchable and sortable.

Instrument Name

DescriptionLab LocationCost Per Hour (Industry)Cost Per Hour (Academic/Gov't)Core Area(s)
Agilent 1290 UPLC (HPLC)This ultra HPLC system is designed to be both a HPLC and high-end UHPLC system in a single flow path.BL05 Analytical Lab60.00 (consumables not included)30.00 (consumables not included)Analytical Chemistry Core
Agilent 920 HPLC Liquid Chromatography SystemThe Varian 920-LC is a robust, highly capable, integrated analytical high performance liquid chromatography (HPLC) system.BL05 Analytical Lab6130.5Analytical Chemistry Core
Agilent 610 FTIR with Single Point DetectorThe Cary 610 is a single point FTIR microscope, capable of mapping when coupled with Cary 670 FTIR spectrometer.BL05 Analytical Lab5527.5Analytical Chemistry Core

Thermo Fisher Nicolet iS50 FTIR

This spectrometer features an all-in-one materials analysis station.BL05 Analytical Lab

60

30

Analytical Chemistry Core

Raptir Microscope for use with Thermo Fisher Nicolet iS50 FTIR

This microscope is used in conjunction with the Thermo Fisher Nicolet iS50 FTIR.

BL05 Analytical Lab

80

40

Analytical Chemistry Core

Micromeritics ASAP 2060 BET Analyzer

Details forthcoming

BL05 Analytical Lab

30.00

15.00

Analytical Chemistry Core

Sample Preparation for BET Analysis

Details forthcoming

BL05 Analytical Lab

1.00

0.50

Analytical Chemistry Core

Agilent 8890-5977B GC-MS

Delivers unparalleled analytical sensitivity with extreme operational efficiencies for ultra trace-level applications.

BL05 Analytical Lab

60 (consumables not included)

30

(consumables not included)

Analytical Chemistry Core

Agilent 7900 ICP-MSThe Agilent 7900 ICP-MS (Inductively Coupled Plasma - Mass Spectrometry) is a flexible single quadrupole ICP mass spectrometer that provides the industry’s best matrix tolerance, most effective helium collision mode, lowest detection limits, and widest dynamic range.BL05 Analytical Lab9045Analytical Chemistry Core
Rigaku Gemini A Single Crystal DiffractometerSingle crystal diffraction is a powerful X-ray technique for structural solution of crystals typically of 20 - 200 microns in diameter. It provides key information on the symmetry and atom positions in these crystals. Usage spans from routine structural work on organic and metal-organic small molecules to highly detailed investigations of heavy metal oxides that can include twins, modulated structures or diffuse scattering.BL05 Analytical Lab9145.5Analytical Chemistry Core
Agilent Cary Eclipse Fluorescence Spectrophotometer - 1The Cary Eclipse fluorescence spectrophotometer was designed for Fluorescence, phosphorescence, chemi/bio-luminescence, and time resolved phosphorescence measurement.BL05 Analytical Lab5527.5Analytical Chemistry Core
Horiba XploRA Raman Confocal MicroscopeThe XploRA Raman microscope combines confocal microscopy with full spectral Raman analysis in one instrument, enabling simultaneous chemical identification and imaging. Common applications include quality control analysis, material validation, and pharmaceutical testing.BL05 Analytical Lab6130.5Analytical Chemistry Core

WiTec alpha300R Confocal Raman Microscope

The WiTec alpha300R Confocal Raman Microscope has hyperspectral image generation with the information of a complete Raman spectrum at every image pixel, excellent lateral resolution, and outstanding depth resolution ideally suited for 3D image generation and depth profiles. It features an ultra-fast Raman imaging option with under one millisecond integration time per spectrum. This is a non-destructive imaging technique: no staining of fixation of the sample required.

BL05 Analytical Lab

90

45

Analytical Chemistry Core

Malvern ZEN3600 ZetasizerThe Zetasizer Nano ZS provides the ability to measure particle size, zeta potential and molecular weight of particles or molecules in a liquid medium over a wide range of concentrations.BL05 Analytical Lab6130.5Analytical Chemistry Core
Nanosight LM10-HSBF Nanoparticle CharacterizationThe Malvern NanoSight LM10 uses the technology of Nanoparticle Tracking Analysis (NTA). The LM10 allows rapid and accurate analysis of the size distribution and concentration of all types of nanoparticles from 10nm to 2000nm in diameter, depending on the instrument configuration and sample type.BL05 Analytical Lab5527.5Analytical Chemistry Core
Rame Hart Goniometer/TensiometerThe Model 260 sports a wide range of methods based interfacial analysis tools for working with pendant, inverted pendant, sessile, and captive bubble drops. Additionally, contact angle, surface energy, surface tension, and calibration tools are included.BL05 Analytical Lab5527.5Analytical Chemistry Core
Sample Preparation Fume HoodUsed for sample preparation in the analytical chemistry core lab.BL04 Sample Prep Lab2010Analytical Chemistry Core
Agilent 400NMRNMR spectrometers are used to test atomic and molecular properties of a sample (e.g. physical and chemical). The system is ideal for compound detection, quantitation and structural confirmation.BL07 NMR Lab5226Analytical Chemistry Core
Agilent 700NMRNMR spectrometers are used to test atomic and molecular properties of a sample (physical, chemical or biological). The system is ideal for compound detection, quantitation and structural confirmation.BL07 NMR Lab9045Analytical Chemistry Core
Agilent Cary 7000 UV-Vis-NIRThe Agilent Cary 7000 universal measurement spectrophotometer (UMS) will satisfy all your solid sampling needs. Collect hundreds of UV-Vis-NIR spectra overnight, or characterize optical components or thin films in minutes to hours rather than hours to days. The Cary 7000 UMS is a turn-key solution for research, development, and QA/QC in optics, thin films/coatings, solar, and glass.BL05 Analytical Lab7035Analytical Chemistry Core
Agilent 670 FTIR Spectrometer w/ATRThe Varian 670 FT-IR is a research-grade spectrometer for application areas such as polymers/materials, pharmaceuticals, biotechnology and chemicals. The Varian 670-IR is also equipped with a diamond ATR crystal for IR sampling.L206 Nanochemistry5527.5Analytical Chemistry Core
CEM Mars 6 Microwave DigesterThis is a microwave synthesizer for performing a wide range of organic and inorganic synthetic chemistry.L206 Nanochemistry5527.5Analytical Chemistry Core
Horiba Fluoro-Max 4 fluorometerThe Horiba FluoroMax 4 spectrometer is an effective tool for measuring fluorescence of solids, liquids, powders and thin films.L206 Nanochemistry5527.5Analytical Chemistry Core
Nanochemistry Lab - General UseThis includes general use of Nanochemistry bench and lab space.L206 Nanochemistry7336.5Analytical Chemistry Core
Legend XFR Centrifuge #1This instrument can handle a range of general-purpose processing including cell culture, microplate, microbiology and many others.L206 Nanochemistry5527.5Analytical Chemistry Core
Legend XFR Centrifuge #2This instrument can handle a range of general-purpose processing including cell culture, microplate, microbiology and many others.L206 Nanochemistry5527.5Analytical Chemistry Core
Varian 710-ES ICP SpectrophotometerThe Varian 710-ES system is a simultaneous Inductively Coupled Plasma Optical Emission Spectrometer (ICP-OES) with trace element analysis capability for wavelength from 177 to 785 nm.L206 Nanochemistry7839Analytical Chemistry Core
Thermo Scientific Escalab Xi+ XPSESCALAB™ XI+ X-ray Photoelectron Spectrometer (XPS) combines high sensitivity with high resolution quantitative imaging and multi-technique capability, including UPS/ISS/REELS.BL05 Analytical Lab10050Analytical Chemistry Core
Kruss TensiometerThis instrument is used for measurements of surface tension and interfacial tension, critical micelle concentration CMC and contact angle on solids, fibers and powders.BL05 Analytical Lab3015Analytical Chemistry Core
TA Instruments TGA 5500The TGA 5500 is designed for the researcher that requires the highest level of performance and features in one package. Built to maximize temperature control and minimize drift, the TGA 5500 has less drift than any competitive TGA – even after they use post-test data manipulation! The TA patented IR furnace delivers the fastest heating and cooling rates available. The all new autosampler makes high productivity standard.BL05 Analytical Lab70.00 (pans not included)35.00 (pans not included)Analytical Chemistry Core
JEOL JEM-2100plus TEMThe JEOL JEM-2100 plus TEM is a multipurpose, 200 kV analytical electron microscope with ultrahigh TEM resolution as high as 0.19 nm (in UHR configuration) and with STEM and EDS options.BL02A TEM Lab16080Advanced Microscopy Core
Nanopatterning Visualization Engine (NPVE)This is used in a Crossbeam® (FIB) system for NanoPatterning, which complements the imaging capabilities of the CrossBeam®.BL02 FESEM Lab6130.5Advanced Microscopy Core
Zeiss Auriga FIB/FESEM with EDXAURIGA CrossBeam consists of a field emission scanning electron microscope (FE-SEM) with GEMINI column accompanied by a Focused Gallium Ion Beam (FIB) column that offers Cross-sectioning, Nanotomography, Nanopatterning, 3D-Analytics, and TEM lamella preparation. Additionally, the system allows for elemental characterization through energy-dispersive X-ray spectroscopy (EDS/EDX).BL02 FESEM Lab8040Advanced Microscopy Core
JEOL JSM-IT800 Schottky FESEMThe JSM-IT800 incorporates an 'In-lens Schottky Plus field emission electron gun' for high resolution imaging to fast elemental mapping, and an electron optical control system 'Neo Engine', as well as a system of seamless GUI 'SEM Center' for fast elemental mapping.BL02 FESEM Lab8040Advanced Microscopy Core
Zeiss Libra TEMLibra 120 Plus is an Energy Filter TEM that takes advantage of inelastically scattered electrons to offer additional imaging modes and enhanced image quality when compared with conventional TEMs. In addiiton, electron energy loss spectroscopy (EELS) capability is available for elemental analysis.BL02A TEM Lab15175.5Advanced Microscopy Core
Zeiss Orion Plus Helium Ion MicroscopeHIM is a relatively new scanning particle beam microscopy technique that operates on the same basic principles as scanning electron microscopes. However, HIM offers several advantages over conventional scanning electron microscopy. The relatively large mass of the helium ions results in very little diffraction when passing through the tiny apertures thereby resulting in extremely small (sub-nanometer) probes. Complementing this, the ions penetrate deeply into the specimen before scattering, resulting in finely localized secondary electron emission. These characteristics of HIM ultimately deliver its incredible 0.3 nm resolution and extremely high depth of field, surpassing conventional SEM. In addition to secondary electron detection, our HIM is outfitted with a Multichannel Plate Detector (MCP) used for detection of backscattered helium ions and providing excellent material contrasts. Also, imaging of non-conductive and non-coated materials e.g. most polymers and biological materials is improved upon with the addition of an electron flood gun used for charge compensation.BL02B Helium Ion Microscope Lab303151.5Advanced Microscopy Core
Leica UC7 UltramicrotomeLeica EM UC7 Ultramicrotome provides easy preparation of semi- and ultrathin sections as well as perfect, smooth surfaces of biological and industrial samples for TEM, SEM, AFM and Light microscopy examination.BL02B Helium Ion Microscope Lab4020Advanced Microscopy Core
Agilent 5600LS AFMThe 5600LS AFM is well suited for imaging and mapping both large and small samples. A variety of Scanning Probe Microscopy (SPM) techniques are possible including contact mode, acoustic ac mode, phase imaging, current sensing, Scanning Tunneling Microscopy (STM), Lateral Force Microscopy (LFM), Kelvin Force Microscopy (KFM)/Electrostatic Force Microscopy (EFM), and Force Modulation Microscopy. In addition, Scanning Microwave Microscopy (SMM) enables complex impedance, capacitance, and dopant density measurements.BL03 AFM Lab7336.5Advanced Microscopy Core
Leica Sputter Coater (AuPd/C)Leica ACE200 is metal sputter and carbon deposition for SEM and TEM analysis.BL04 Sample Prep Lab2010Advanced Microscopy Core
South Bay Plasma Cleaner (O2/Ar)The PC-2000 Plasma Cleaner allows simultaneous cleaning of a specimen and a specimen stage which minimizes and, in some cases, eliminates contamination of inorganic specimens analyzed via SEM, TEM, STEM and/or AEM.BL04 Sample Prep Lab2010Advanced Microscopy Core
Axio Imager Z2M upright MicroscopeAxio Z2m is an upright materials microscope, utilizing multiple light sources and filters and allows for the collection of high resolution still images at 50-1,000x.L104 NanoBioPhysics5527.5Advanced Microscopy Core
Cytoviva Darkfield and Hyperspectral ImagingThis instrument is designed to support optical and hyperspectral imaging of nanoscale sample elements in both materials and biological based matrices.L104 NanoBioPhysics6130.5Advanced Microscopy Core
Hitachi S-4800 FESEM w/EDX*The S-4800 is a high-resolution scanning electron microscope (SEM) with cold field emission gun. With a maximum resolution of 1-2nm, it is equipped with energy-dispersive X-ray spectroscopy (EDS).L110 Cleanroom2010Advanced Microscopy Core
Zeiss EVO LS SEMZeiss EVO LS10 is a variable pressure scanning electron microscope (VP-SEM), Capable of 6nm resolution in high vacuum mode. In extended pressure mode, imaging can be done at set pressures up to 3000 Pa. If used in conjunction with the Deben CoolStage II, biological and other wet samples may be imaged using the variable pressure secondary electron (VPSE) or backscatter detectors. Elemental analysis using the Oxford Inca EDX can be done in all modes.L110N BioCleanroom8040Advanced Microscopy Core
Zeiss - Axio Observer A1The Observer A1 is an upright compound microscope that is fully equipped four channel wide-field fluorescence, bright-field, dark-field and polarized light microscopy.L102 NanoBiology Lab4020Advanced Microscopy Core
Zeiss Z1 Spinning Disk ConfocalZeiss Axio Observer Spinning Disc Confocal microscope has objectives ranging from 10X-100X and provides four channel laser excitation capability from the near UV into the near infrared range. In addition, the stage mounted temperature controlled CO2 chamber is capable of long term live cell imaging.L207 Shared Microscope Lab6130.5Advanced Microscopy Core
Evident FV3000 Confocal MicroscopeThe Evident FV3000 has highly efficient and accurate TruSpectral detection on all channels. It is optimized for live cell imaging with high sensitivity and low phototoxicity.BL02B Helium Ion Microscope Lab8040Advanced Microscopy Core
Buehler MetaServ 250 Grinder-PolisherThis instrument is used for metallographic specimen preparation.BL04 Sample Prep Lab2010Advanced Microscopy Core
Asylum MFP-3D Origin+ AFMThis instrument is capable of nanomechanical, nanoelectrical and electromechanical characterization.BL03 AFM Lab7336.5Advanced Microscopy Core
Thermo 325a Rotary MicrotomeThis instrument is capable of cutting high-quality paraffin sections for tissue processing.BL04 Sample Prep Lab3015Advanced Microscopy Core
Beckman Coulter Cytoflex Flow CytometerThe CytoFLEX Flow Cytometer, the first introduction to the CytoFLEX Platform, provides superior sensitivity and resolution throughout all configurations. It utilizes CytExpert for CytoFLEX Acquisition and Analysis Software.L102 NanoBiology Lab6030Nanobiology Core

FACS Aria III - Flow Cytometer System

BD FACSAria provides unrivaled sensitivity and resolution for cell sorting. Wavelength choices include 561-nm and 445-nm

lasers, as well as the 488-nm, 633-nm, 405-nm, and 375-nm lasers.

L102 NanoBiology Lab

73.00

36.50

Nanobiology Core

Hot Disk TPS2500S Thermal Conductivity SystemThe TPS2500S is transient absolute measurment of thermal conductivity, thermal diffusivity and specific heat from 0.005 to 1000W/mK. This instrument is designed for testing thermal transport properties of solids, liquids, paste and powders.L106 NM Charac Lab5527.5Material Testing Core
Perkin Elmer DMA8000Dynamic Mechanical Analysis (DMA) is used to characterize materials' bulk properties such as modulus, compliance and damping (tan delta). It measures changes of rheological behavior under dynamic conditions as a function of temperature, time, frequency, stress, atmosphere, or a combination of these parameters. Stress-strain, creep recovery, thermomechanical and stress relaxation measurements are examples.L106 NM Charac. Lab5527.5Material Testing Core
TA Q200 Digital Scanning CalorimeterThe Q200 is a versatile, research-grade DSC with our patented Tzero technology with temperature range of ambient to 725C.BL05 Analytical Lab6130.5Material Testing Core
TA Q500 Thermogravimetric AnalyzerThermogravimetric analysis is capable of thermal analysis in which changes in physical and chemical properties of materials are measured as a function of increasing temperature or as a function of time.BL05 Analytical Lab6130.5Material Testing Core
Cascade REL-4800 Manual Probe StationThis is manual wafer load probe station with 200mm vacuum chuck. It also includes 5 vacuum connections for manipulators on each side with motic PSM-1000 microscope.L104 NanoBioPhysicsContact for pricingContact for pricingMaterial Testing Core

Princeton VeraSTAT4 Potentiostat/Galvanostat

VeraSTAT4 is capable of performing a range of electrochemical applications. It has improved low current performance with fA

resolution and pA accuracy. The maximum current is up to 1A. With the internal frequency response analyzer, it provides impedance analysis over the

frequency range 10Hz to 1MHz.

L104 NanoBioPhysics 

Contact for pricing

Contact for pricing

Hysitron TI 950 NanoindenterThe TI 950 TriboIndenter nanoindenter is an automated, high throughput instrument to support nanomechanical and nanotribological characterization over the nano and microscales. The instruments also enables High Precision Scanning Probe Microscopy.BL03 AFM Lab7035Material Testing Core

Stratasys J750 FDM printer

The Stratasys J750™ 3D Printer delivers unrivaled

aesthetic performance including true, full-color

capability with texture mapping and color gradient

L105 Synthesis Lab

Contact for pricing

Contact for pricing

Carbolite High Temp FurnaceThis is a high temperature furnace for laboratory, research & process applications.L105 Synthesis Lab6130.5Micro- and Nanofabrication Core
Synthesis Lab General UseThis includes general use of synthesis lab and bench space.L105 Synthesis Lab5527.5Micro- and Nanofabrication Core
Cleanroom General UseThis includes entry fees to use cleanroom.L110 Cleanroom13065Micro- and Nanofabrication Core
Air Control Wet Bench - PolyThis 200 mm compatible wet bench is primarily used for general wet chemical etching.L110 Cleanroomincluded in cleanroom feeincluded in cleanroom feeMicro- and Nanofabrication Core
Air Control Wet Bench - StainlessThis 200 mm compatible wet bench is primarily used for CMOS-level cleans.L110 Cleanroomincluded in cleanroom feeincluded in cleanroom feeMicro- and Nanofabrication Core
Americhem Wet Bench*This 200 mm wet bench is primarily used for special etching purposes.L110 Cleanroomincluded in cleanroom feeincluded in cleanroom feeMicro- and Nanofabrication Core
Lam OnTrak DSS200 Series II Brush CleanerOnTrak DSS 200 Series 2 Double-sided PVA Scrubber is production-style tool for cleaning particles as small as 0.125 um in wafers up to 200mm.L110 Cleanroom3015Micro- and Nanofabrication Core
3DGence F350 3D PrinterThis instrument is a dual extruder 3D printer designed for industrial applications. It is suitable for working with a wide range of technical materials including high-performance thermoplastics.L110 Cleanroom10 (doesn't include cost of filament)5 (doesn't include cost of filament)Micro- and Nanofabrication Core
IPEC Avanti CMP System*The IPEC 472 wafer polisher is a fully automated, precision tool for CMP polishing of semiconductor wafers used to achieve flatness, uniformity and planarization on patterned/device wafers. The 472 features automatic wafer handling and is capable of two platen, two-step polishing processing to maximize wafer throughput capability and quality. Designed to planarize wafers from 100mm to 200mm.L110 Cleanroom3015Micro- and Nanofabrication Core
Lam 4420B Plasma Etch System*This tool is primarily used for silicon, oxide and nitride etching using SF6 and CF4 based gas chemistry.L110 Cleanroom3015Micro- and Nanofabrication Core
Novellus Concept 2 PECVD System*This tool can deposit stress-controlled silicon dioxide and nitride on wafer stack.L110 Cleanroom12160.5Micro- and Nanofabrication Core
Plasmatherm ICP 770 DRIE*An ICP (inductively coupled plasma) etcher (DRIE) can be used to etch a variety of materials. This ICP is equipped with two chambers -- one is dedicated to deep anisotropic silicon (BOSCH process) trench etching and the other is used for silicon dioxide and polymer etching.L110 Cleanroom8040

Micro- and Nanofabrication Core

PVD 75 Evaporation System*

The evaporator can be used to deposit metals dielectrics. The tool has 5 e-beam pockets and 1 thermal boat. Single substrate up to 12 diameter -Multiple substrate up to 4 diameter -Substrate fixture rotation up to 20 rpm.

L110 Cleanroom

30

15

Micro- and Nanofabrication Core

PVD 75 Sputtering System*

The sputterer can be used to deposit metals and dielectrics. The tool has 2 DC and 1 RF source. Coatings are performed by accelerating ions or an argon oxygen mixture into the surface of a sputter target, which is made of the material to be applied to the sample. -Sputter two or more dissimilar materials simultaneously for complete control of film stoichiometry (co-deposition). Single substrate up to 12 diameter -Multiple substrate up to 4 diameter -Substrate fixture rotation up to 20rpm.

L110 Cleanroom

30

15

Micro- and Nanofabrication Core

Veeco Savannah S200 Thermal ALD*This is a Thermal Atomic Layer Deposition system for dielectrics with In-Situ Ellipsometry.L110 Cleanroom137.568.75Micro- and Nanofabrication Core
KLA Zeta 20 Optical ProfilerThe Zeta™-20 is a fully integrated optical profiling microscope that provides 3D metrology and imaging capability in a compact, robust package. The system is powered by ZDot™ technology, which simultaneously collects high-resolution 3D data and a True Color infinite focus image. The Zeta-20 supports both R&D and production environments with Multi-Mode optics, easy-to-use software, and a low cost of ownership.L110 Cleanroomincluded in cleanroom feeincluded in cleanroom feeMicro- and Nanofabrication Core
Gaertner EllipsometerThe model LSE-WS Stokes WAFERSKAN Ellipsometer is a high speed film thickness mapping system measuring one site per second including stage travel! It uses advanced StokesMeter technology to give tilt-free, focus free, 2D/3D color thickness and index images.L110M - Lithographyincluded in cleanroom feeincluded in cleanroom feeMicro- and Nanofabrication Core
Jandel Multi-Height 4 Point ProbeHigh quality, easy to use system for measuring the sheet resistance and/or volume resistivity of wafers up to 200mm in diameter.L110M - Lithographyincluded in cleanroom feeincluded in cleanroom feeMicro- and Nanofabrication Core
Laurell Spin Processor with Wet StationThis coater system can accommodate up to 200mm wafers with recommended rotational speed of 3000 RPM.L110M - Lithographyincluded in cleanroom feeincluded in cleanroom feeMicro- and Nanofabrication Core
OAI 8808 Mask Aligner*The OAI Model 8008 Mask Aligner is a semi-automated, four-camera, optical front and backside mask Aligner. It delivers ultra-precise (1m-2m) alignment accuracy.L110M - Lithography6030Micro- and Nanofabrication Core
PE-100-RIE Plasma Etch SystemThis tool is capable of plasma cleaning or plasma etching with 300W 100KHz continuously variable power supply.L110M - Lithographyincluded in cleanroom feeincluded in cleanroom feeMicro- and Nanofabrication Core
Tousimis 916B Critical Point Dryer*

This is a supercritical CPD MEMS dryer for 8

wafers. The temperature range is -30C to 60C, and the pressure range is 0 to 2000 psi.

L110M - Lithography

20

10

Micro- and Nanofabrication Core

Ultron UH-102 UV Curing OvenThis tool provides for curing of UV films in easy-to-use benchtop packages, without sacrificing control or versatility.L110M - Lithographyincluded in cleanroom feeincluded in cleanroom feeMicro- and Nanofabrication Core
Vacuum OvenThis instrument is used to vacuum heat or cure substrates.L110M - Lithographyincluded in cleanroom feeincluded in cleanroom feeMicro- and Nanofabrication Core
MicroFab Jetlab 4 Ink Printer SystemThis tool can print droplets in an area of 160 X 120 mm with 20um accuracy.L110N BioCleanroom5025Micro- and Nanofabrication Core
Cray XC-30 supercomputing systemUsed for engineering and scientific computing on 8 computer blades with 4 compute nodes per bladeHigh Performance Computing LabContact for pricingContact for pricingOther
Nikon X-ray CT XT H 225 ST 2xSee https://jsnn.ncat.uncg.edu/nikon-x-ray-ct/BL07 NMR Lab12575 (external), 35 (internal)Other
Computer Workstation for Nikon CTSee https://jsnn.ncat.uncg.edu/nikon-x-ray-ct/BL07 NMR Lab2525 (external), 15 (internal)Other